photoresist process
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美
网络 光刻胶工艺
双语例句
- Recording the interference fringe produced from two coherent light beams by use of photoresist is a key process in manufacturing a holographic grating.
由光致刻蚀剂记录两束相干光干涉条纹是制作全息光栅的关键步骤。 - Study on Synthesis of Photoresist and Photochemical Process for Information Recording in Laser Disc
激光光盘信息记录光刻胶的合成与感光 - Study on the properties of photoresist baking process
光刻胶烘培特性研究 - Photoresist ashing process and fabrication of deep submicrometer lines
光刻胶灰化工艺与深亚微米线条的制作 - A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process
用于光刻胶刻蚀过程模拟的二维动态CA模型 - Research on thick photoresist mask electroplating process in micro-fabrication
微加工厚光刻胶掩膜电镀工艺研究 - The experiments show that this model can describe the actual density distribution of laser energy absorbed by photoresist more precisely. It can provide reliable evidence for the proximity correction in laser direct writing as well as the simulation of photolithography process in fabricating micro optic elements.
实验表明，该模型能更精确地表示光刻胶吸收激光能量密度分布的实际情况，能为激光直写邻近校正及微光学元件等光刻过程的计算机模拟提供可靠的依据。 - This photoresist is very sensitive to the process parameters.
但SU8胶对工艺参数很敏感。 - Study on the properties of photoresist baking process Fabrication Technology of Microlens Array by Melting Photoresist
光刻胶烘培特性研究微透镜阵列的光刻胶热熔制作技术 - Based on SU-8 photoresist UV-LIGA technology has the complex structure of micro-molding, high aspect ratio and near-vertical sidewalls such prominent advantages. The use of sacrificial layer UV-LIGA technology or overlay process can fabricate step structure.
基于SU-8胶的UV-LIGA技术具有微小复杂结构成型、高深宽比和侧壁近乎垂直等突出优点，利用牺牲层UV-LIGA或套刻等工艺能制作台阶结构。 - According to the analysis of the photoresist process that got organic initiator conditions, nanometer of physical map was obtained.
根据对有机引发剂条件下的光刻胶过程的分析得出了纳米级实体图。 - To generalize the time axis exposure model, the components of SU-8 photoresist and its photopolymerisable reaction in exposure process were analyzed, and a reaction kinetics model befitting SU-8 was built.
在时间轴模型的扩展方面，分析了SU-8光刻胶的组成及其曝光交联化学反应过程，建立了适合于SU-8胶的光交联反应动力学模型。 - Through many experiments, a set of optimal micro-cup design parameters and the corresponding SU-8 thick photoresist lithography process were found.
通过多次实验，摸索出了一组最优的微型杯设计参数以及相应SU-8厚光刻胶光刻工艺流程，按此流程制备出的微型杯阵列图形完好、线条清晰。